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| Artikel-Nr.: 5667A-9783642687815 Herst.-Nr.: 9783642687815 EAN/GTIN: 9783642687815 |
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| I Machine Aspects of Ion Implantation.- Ion Implantation System Concepts.- Ion Sources.- Faraday Cup Designs for Ion Implantation.- Safety and Ion Implanters.- II Ion Ranges in Solids.- The Stopping and Range of Ions in Solids.- The Calculation of Ion Ranges in Solids with Analytic Solutions.- Range Distributions.- III Measuring Techniques and Annealing.- Electrical Measuring Techniques.- Wafer Mapping Techniques for Characterization of Ion Implantation Processing.- Non-Electrical Measuring Techniques.- Annealing and Residual Damage.- IV Appendix: Modern Ion Implantation Equipment TM.- Evolution and Performance of the Nova NV-10 Predep(TM) Implanter.- Ion Implantation Equipment from Veeco.- The Series III A and IIIX Ion Implanters.- Standard High-Voltage Power Supplies for Ion Implantation.- The IONMICROPROBE A-DIDA 3000-30 for Dopant Depth Profiling and Impurity Bulk Analysis.- List of Contributors. Weitere Informationen: | | Author: | H. Ryssel; H. Glawischnig | Verlag: | Springer Berlin | Sprache: | eng |
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| Weitere Suchbegriffe: chemische technik - englischsprachig, Absorption; Apertur; Plasmat; computer; Design; Development; Machine; Material; Mechanisms; Model; production; scattering; Semiconductor; Spectroscopy; Units, Absorption, Apertur, Plasmat, computer, design, development, machine, material, mechanisms, model |
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